The CIQTEK SEM5000X is an ultra-high resolution FESEM with optimized electron optics column design, reducing overall aberrations by 30%, achieving ultra-high resolution of 0.6 nm@15 kV and 1.0 nm@1 kV.
Its high resolution and stability make it advantageous in advanced nano-structural materials research, as well as the development and manufacturing of high-technology node semiconductor IC chips.
Objective Lens Upgrade
Lens chromatic aberration was reduced by 12%, lens spherical aberration was reduced by 20%, and overall aberration was reduced by 30%.
Dual Beam Deceleration Technology
In-lens beam deceleration, applicable to specimens with large volumes, cross-sections, and irregular surfaces. Dual deceleration technology (In-lens beam deceleration + specimen stage tandem beam deceleration) challenges the limits of specimen surface signal-capturing scenarios.